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Live Webinar
Thursday, November 21 at 11:00 a.m. EST |
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Best Practices Series: Advances In ED-XRF and ICP-OES Technology Improve Chemical and Petrochemical Analysis |
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As a tool for elemental analyses ED-XRF and ICP-OES are the instruments of choice for process control, since they provide the versatility, precision and sensitivity, robustness, uptime and ease of use.
The webcast will concentrate on how, using modern technologies with unique new advances, can have a drastic improvement on efficiency, performance, and valuable time can be saved, - the application of high performance equipment can make the use of additional techniques obsolete, how sample to samples times can be reduced and instrument operating costs be minimized.
Challenges related to process control, the relevant effects and solutions how they can be eliminated or avoided will be presented. Using various applications available technologies will be discussed.
What you will learn:
- Selecting the correct ICP-OES analyzer for ultimate productivity – new unique plasma view technology introduction that can offer twice the sensitivity of conventional units
- New technology advances in ED-XRF
- Attain trace level of sulfur and halogen
- Differences between ICP optical systems and how it impacts performanc
- The importance of plasma viewing
- How to improve throughput and dramatically reduce your cost of operation
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