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Agilent Atomic Spectroscopy Solutions for the Semiconductor Industry
The Agilent ICP-QQQ Semiconductor Applications Compendium contains ten years of collective knowledge from Agilent ICP-QQQ users and semiconductor specialists.
The compendium contains over 20 optimized methods to measure inorganic contamination and particles in semiconductor materials.
The methods include instrument configuration and tuning parameters, sample and standard preparation details and representative results.
The compendium is the ultimate guide to help you setup or refine your inorganic contamination testing.
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Multielement Nanoparticle Analysis of Semiconductor Process Chemicals Using spICP-QQQ
Learn how the single particle ICP-QQQ (spICP-MS) technique can be used to characterize Ag, Fe3O4, Al2O3, Au, and SiO2 nanoparticles in semiconductor grade tetra methyl ammonium hydroxide (TMAH). Using the Agilent rapid multi-element nanoparticle analysis software, data can be collected sequentially for up to 16 elements in a single analysis, using optimum conditions for the measurement of each individual element. This function saves time and reduces the risk of contamination compared to conventional spICP-MS analysis, as data for multiple elements can be obtained with only one visit to the sample vial.
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Automated Analysis of Semiconductor Grade Hydrogen Peroxide and DI Water using ICP-QQQ
This study describes an automated procedure to quantify ultratrace elemental impurities in de-ionized (DI) water and H2O2 using an Agilent 8900 ICP-QQQ fitted with an ESI prepFAST S automated sample introduction system. The prepFAST S automates sample preparation and calibration, saving time and minimizing the risk of sample-contamination from manual sample handling operations.
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Automated Analysis of Ultratrace Elemental Impurities in Isopropyl Alcohol
This study demonstrates how to measure ultratrace (parts-per-trillion) levels of inorganic impurities in isopropyl alcohol, a key process chemical for semiconductor fabrication. The method includes online calibration using the IAS Automated Standard Addition System for an Agilent ICP-QQQ instrument. The method allows the accurate and reliable quantification of ultratrace level impurities in IPA without requiring a highly skilled analyst.
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Analysis of Ultratrace Impurities in High Silicon Matrix Samples by ICP-QQQ
Learn how an Agilent 8900 ICP-QQQ was used to analyze two Si samples prepared at matrix levels that are typically analyzed in the semiconductor industry. Excellent precision was achieved for the measurement of 50 ppt spikes in the Si matrix samples over a 1 hour analytical run, demonstrating the effectiveness, robustness, and sensitivity of the method.
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Ultra-low level determination of phosphorus, sulfur, silicon and chlorine using the Agilent 8900 ICP-QQQ
This study demonstrates the use of an Agilent 8900 ICP-QQQ operating in MS/MS mode with O2 and H2 cell gases to successfully eliminate problematic spectral interferences on non-metallic impurities P, S, Si and Cl in UPW and P, S and Si in semiconductor-grade hydrogen peroxide. This method allows the analysis of these impurities at ppt and ppb levels.
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Ultrapure Process Chemicals Analysis by ICP-QQQ with Hot Plasma Conditions
Hot plasma conditions on an Agilent 8900 ICP-QQQ instrument can be used to meet the single- and sub-ppt guideline levels for ASTM/SEMI elements in ultrapure water. This study demonstrates how to do the analysis and the typical results to expect for this important contamination-control measurement.
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Analysis of Trace Metal Impurities in High Purity Hydrochloric Acid Using ICP-QQQ
In this study, triple quadrupole ICP-MS (ICP-QQQ) was used to analyze 50 elements in HCl, using MS/MS mode to resolve the polyatomic interferences. All analytes, including the most problematic elements such as K, V, Cr, Ge, and As, could be determined directly in the undiluted HCl with single digit ppt detection limits. This analysis is important for contamination control of inorganics in process chemicals such as HCl.
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